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Semiconductor Vacuum System
Material Analysis Machine
SMT Assembly Machine
Cable Testers
Inspection Machine
Displacement Dynamic Signal Analysis System
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Semiconductor Vacuum System
GaAS,InP and GaSb epitaxy; HgCdTe epitaxy; GaN,InN and AlN epitaxy; II-VI epitaxy; SiGe epitaxy; Si/Metal/Oxide epitaxy; Magnetron sputtering; Pulsed Laser Deposition (PLD); Electron Beam Evaporation; Ion Beam Deposition; Thermal Evaporation-
DCA R450 MBE
DCA The DCA R450 MBE is a compact R&D MBE system ideally suited for III-V, II-VI or GaN epitaxy. The system is available with tw… -
DCA R600 MBE
DCA The DCA R600 MBE has a growth chamber which is optimized for large capacity effusion cells and up to 4" substrate size. The s… -
PLD500 pulsed laser deposition system
DCA The PLD500 pulsed laser deposition system is a load locked deposition system with unique chamber geometry. The design allows … -
Liquited Nitrogen System from DeMaCo Holland BV
DeMaCo Liquited Nitrogen System from DeMaCo Holland BV Function of LN2 system Molecular Beam Epitaxy (MBE) systems are very… -
PTSA ICP Plasma Etcher SI 500
SENTECH PTSA ICP Plasma Etcher SI 500 The SI 500 has been developed for high rate and low damage plasma etch processes, especially … -
SI 500 D PTSA ICP Plasma Deposition System
SENTECH SI 500 D PTSA ICP Plasma Deposition System The SI 500 D is a high density plasma deposition system developed for ICPECVD of di…
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